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X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films
X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films
X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films
Jiang, L. (author) / Fitzgerald, A. G. (author) / Rose, M. J. (author) / Cheung, R. (author) / Rong, B. (author) / van der Drift, E. (author)
APPLIED SURFACE SCIENCE ; 193 ; 144-148
2002-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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