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Characteristics of copper films produced via atomic layer deposition

Huo, J. / Solanki, R. / McAndrew, J.

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Characteristics of copper films produced via atomic layer deposition

Huo, J. / Solanki, R. / McAndrew, J.

Characteristics of copper films produced via atomic layer deposition

Huo, J. / Solanki, R. / McAndrew, J.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Characteristics of copper films produced via atomic layer deposition

Contributors:

Huo, J. (author) / Solanki, R. (author) / McAndrew, J. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 17 ; 2394-2398

Publication date:

2002-01-01

Size:

5 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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