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Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited
Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited
Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited
Martin, N. (Autor:in) / Lintymer, J. (Autor:in) / Gavoille, J. (Autor:in) / Takadoum, J. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 37 ; 4327-4332
01.01.2002
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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