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Simulation of oxide sputtering and SIMS depth profiling of delta-doped layer

Yamamura, Y. / Ishida, M.

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Simulation of oxide sputtering and SIMS depth profiling of delta-doped layer

Yamamura, Y. / Ishida, M.

Simulation of oxide sputtering and SIMS depth profiling of delta-doped layer

Yamamura, Y. / Ishida, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Simulation of oxide sputtering and SIMS depth profiling of delta-doped layer

Contributors:

Yamamura, Y. (author) / Ishida, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 203-204 ; 62-68

Publication date:

2003-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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