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SIMS and high-resolution RBS analysis of ultrathin SiOxNy films

Kimura, K. / Nakajima, K. / Kobayashi, H. / Miwa, S. / Satori, K.

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SIMS and high-resolution RBS analysis of ultrathin SiOxNy films

Kimura, K. / Nakajima, K. / Kobayashi, H. / Miwa, S. / Satori, K.

SIMS and high-resolution RBS analysis of ultrathin SiOxNy films

Kimura, K. / Nakajima, K. / Kobayashi, H. / Miwa, S. / Satori, K.

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Order at Subito €

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Document information

Title:

SIMS and high-resolution RBS analysis of ultrathin SiOxNy films

Contributors:

Kimura, K. (author) / Nakajima, K. (author) / Kobayashi, H. (author) / Miwa, S. (author) / Satori, K. (author)

Published in:

APPLIED SURFACE SCIENCE ; 203-204 ; 418-422

Publication date:

2003-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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