SiOxNy thin films with variable refraction index: Microstructural, chemical and mechanical properties: Fid-Bau Portal

SiOxNy thin films with variable refraction index: Microstructural, chemical and mechanical properties

Godinho, V. / Haro, M. C. / Garcia-Lopez, J. / Goossens, V. / Terryn, H. / Delplancke-Ogletree, M. P. / Fernandez, A.

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SiOxNy thin films with variable refraction index: Microstructural, chemical and mechanical properties

Godinho, V. / Haro, M. C. / Garcia-Lopez, J. / Goossens, V. / Terryn, H. / Delplancke-Ogletree, M. P. / Fernandez, A.

SiOxNy thin films with variable refraction index: Microstructural, chemical and mechanical properties

Godinho, V. / Haro, M. C. / Garcia-Lopez, J. / Goossens, V. / Terryn, H. / Delplancke-Ogletree, M. P. / Fernandez, A.

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Check availability in my library

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Document information

Title:

SiOxNy thin films with variable refraction index: Microstructural, chemical and mechanical properties

Contributors:

Godinho, V. (author) / Haro, M. C. (author) / Garcia-Lopez, J. (author) / Goossens, V. (author) / Terryn, H. (author) / Delplancke-Ogletree, M. P. (author) / Fernandez, A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 256 ; 4548-4553

Publication date:

2010-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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Quantitative depth profiling of SiOxNy layers on Si

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Optical emission spectroscopy investigation of sputtering discharge used for SiOxNy thin films deposition and correlation with the film composition

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Formation of silicon on plasma synthesized SiOxNy and reaction mechanism

Zhu, M. / Shi, X. / Chen, P. et al. | British Library Online Contents | 2005