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TOF-SIMS measurement of ultra-thin SiO2 films prepared by the graded-etching method

Shibamori, T. / Muraji, Y. / Man, N. / Karen, A.

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TOF-SIMS measurement of ultra-thin SiO2 films prepared by the graded-etching method

Shibamori, T. / Muraji, Y. / Man, N. / Karen, A.

TOF-SIMS measurement of ultra-thin SiO2 films prepared by the graded-etching method

Shibamori, T. / Muraji, Y. / Man, N. / Karen, A.

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Order at Subito €

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Document information

Title:

TOF-SIMS measurement of ultra-thin SiO2 films prepared by the graded-etching method

Contributors:

Shibamori, T. (author) / Muraji, Y. (author) / Man, N. (author) / Karen, A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 203-204 ; 449-452

Publication date:

2003-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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