Charge compensation using optical conductivity enhancement and simple analytical protocols for SIMS of resistive Si1-xGex alloy layers: Fid-Bau Portal

Charge compensation using optical conductivity enhancement and simple analytical protocols for SIMS of resistive Si1-xGex alloy layers

Dowsett, M. G. / Morris, R. / Chou, P. F. / Corcoran, S. F. / Kheyrandish, H. / Cooke, G. A. / Maul, J. L. / Patel, S. B.

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Charge compensation using optical conductivity enhancement and simple analytical protocols for SIMS of resistive Si1-xGex alloy layers

Dowsett, M. G. / Morris, R. / Chou, P. F. / Corcoran, S. F. / Kheyrandish, H. / Cooke, G. A. / Maul, J. L. / Patel, S. B.

Charge compensation using optical conductivity enhancement and simple analytical protocols for SIMS of resistive Si1-xGex alloy layers

Dowsett, M. G. / Morris, R. / Chou, P. F. / Corcoran, S. F. / Kheyrandish, H. / Cooke, G. A. / Maul, J. L. / Patel, S. B.

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Document information

Title:

Charge compensation using optical conductivity enhancement and simple analytical protocols for SIMS of resistive Si1-xGex alloy layers

Contributors:

Dowsett, M. G. (author) / Morris, R. (author) / Chou, P. F. (author) / Corcoran, S. F. (author) / Kheyrandish, H. (author) / Cooke, G. A. (author) / Maul, J. L. (author) / Patel, S. B. (author)

Published in:

APPLIED SURFACE SCIENCE ; 203-204 ; 500-503

Publication date:

2003-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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Reactive ion etching of Si1-xGex alloy with hydrogen bromide

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A floating low energy electron gun (FLEG) for charge compensation in SIMS and other applications

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