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Ti diffusion in chalcogenides: a ToF-SIMS depth profile characterization approach

Alberici, S. G. / Zonca, R. / Pashmakov, B.

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Ti diffusion in chalcogenides: a ToF-SIMS depth profile characterization approach

Alberici, S. G. / Zonca, R. / Pashmakov, B.

Ti diffusion in chalcogenides: a ToF-SIMS depth profile characterization approach

Alberici, S. G. / Zonca, R. / Pashmakov, B.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Ti diffusion in chalcogenides: a ToF-SIMS depth profile characterization approach

Contributors:

Alberici, S. G. (author) / Zonca, R. (author) / Pashmakov, B. (author)

Published in:

APPLIED SURFACE SCIENCE ; 231/232 ; 821-825

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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