Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Phosphorous degassing from poly silicon under thermal exposure: A ToF-SIMS depth profile investigation

    New search for: Alberici, S. G.
    New search for: Piagge, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Phosphorous degassing from poly silicon under thermal exposure: A ToF-SIMS depth profile investigation

    New search for: Alberici, S. G.
    New search for: Piagge, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Phosphorous degassing from poly silicon under thermal exposure: A ToF-SIMS depth profile investigation

    New search for: Alberici, S. G.
    New search for: Piagge, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Phosphorous degassing from poly silicon under thermal exposure: A ToF-SIMS depth profile investigation

    Contributors:

    Alberici, S. G. (author) / Piagge, R. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 252 ; 7272-7274

    Publication date:

    2006-01-01

    Size:

    3 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    SIMS depth profile analysis of sodium in silicon dioxide

    Yamamoto, Y. / Shimodaira, N. | British Library Online Contents | 2008

    Ti diffusion in chalcogenides: a ToF-SIMS depth profile characterization approach

    Alberici, S. G. / Zonca, R. / Pashmakov, B. | British Library Online Contents | 2004

    SIMS depth profile of copper in low-k dielectrics under electron irradiation for charge compensation

    Yamada, K. / Fujiyama, N. / Sameshima, J. et al. | British Library Online Contents | 2003

    Range evaluation in SIMS depth profiles of Er-implantations in silicon

    Mayerhofer, K. / Foisner, H. / Piplits, K. et al. | British Library Online Contents | 2005

    Accurate SIMS depth profiling for ultra-shallow implants using backside SIMS

    Hongo, C. / Tomita, M. / Takenaka, M. et al. | British Library Online Contents | 2003

    Back to top