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Characterization of high-k gate dielectric films using SIMS

Yamamoto, T. / Morita, N. / Sugiyama, N. / Karen, A. / Okuno, K.

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Characterization of high-k gate dielectric films using SIMS

Yamamoto, T. / Morita, N. / Sugiyama, N. / Karen, A. / Okuno, K.

Characterization of high-k gate dielectric films using SIMS

Yamamoto, T. / Morita, N. / Sugiyama, N. / Karen, A. / Okuno, K.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Characterization of high-k gate dielectric films using SIMS

Contributors:

Yamamoto, T. (author) / Morita, N. (author) / Sugiyama, N. (author) / Karen, A. (author) / Okuno, K. (author)

Published in:

APPLIED SURFACE SCIENCE ; 203-204 ; 516-519

Publication date:

2003-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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