SIMS study of Cu trapping and migration in low-k dielectric films: Fid-Bau Portal

SIMS study of Cu trapping and migration in low-k dielectric films

Li, Y. / Hunter, J. / Tate, T. J.

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SIMS study of Cu trapping and migration in low-k dielectric films

Li, Y. / Hunter, J. / Tate, T. J.

SIMS study of Cu trapping and migration in low-k dielectric films

Li, Y. / Hunter, J. / Tate, T. J.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

SIMS study of Cu trapping and migration in low-k dielectric films

Contributors:

Li, Y. (author) / Hunter, J. (author) / Tate, T. J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 231/232 ; 791-795

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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