SIMS depth profiling of advanced gate dielectric materials

Bennett, J. / Gondran, C. / Sparks, C. et al. | British Library Online Contents | 2003

Characterization of HfO2 dielectric films with low energy SIMS

Jiang, Z. X. / Kim, K. / Lerma, J. et al. | British Library Online Contents | 2006

Characterization and production metrology of gate dielectric films

Diebold, A. C. / Canterbury, J. / Chism, W. et al. | British Library Online Contents | 2001

SIMS study of Cu trapping and migration in low-k dielectric films

Li, Y. / Hunter, J. / Tate, T. J. | British Library Online Contents | 2004

Characterization of high-k gate dielectric/silicon interfaces

Miyazaki, S. | British Library Online Contents | 2002