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Atomic layer deposition of hafnium and zirconium silicate thin films

Vainonen-Ahlgren, E. / Tois, E. / Ahlgren, T. / Khriachtchev, L. / Marles, J. / Haukka, S. / Tuominen, M.

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Atomic layer deposition of hafnium and zirconium silicate thin films

Vainonen-Ahlgren, E. / Tois, E. / Ahlgren, T. / Khriachtchev, L. / Marles, J. / Haukka, S. / Tuominen, M.

Atomic layer deposition of hafnium and zirconium silicate thin films

Vainonen-Ahlgren, E. / Tois, E. / Ahlgren, T. / Khriachtchev, L. / Marles, J. / Haukka, S. / Tuominen, M.

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Title:

Atomic layer deposition of hafnium and zirconium silicate thin films

Contributors:

Vainonen-Ahlgren, E. (author) / Tois, E. (author) / Ahlgren, T. (author) / Khriachtchev, L. (author) / Marles, J. (author) / Haukka, S. (author) / Tuominen, M. (author)

Published in:

COMPUTATIONAL MATERIALS SCIENCE ; 27 ; 65-69

Publication date:

2003-01-01

Size:

5 pages

ISSN:

0927-0256

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1 / 510

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Reich, S. / Suhr, H. / Hanko, K. et al. | British Library Online Contents | 1992

Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures

Aarik, J. / Aidla, A. / Mandar, H. et al. | British Library Online Contents | 2001

ZIRCONIUM, HAFNIUM, TITANIUM PRECURSORS AND DEPOSITION OF GROUP 4 CONTAINING FILMS USING THE SAME

GATINEAU SATOKO / NOH WONTAE / KIM DAEHYEON et al. | European Patent Office | 2019

Free access

ZIRCONIUM, HAFNIUM, TITANIUM PRECURSORS AND DEPOSITION OF GROUP 4 CONTAINING FILMS USING THE SAME

GATINEAU SATOKO / NOH WONTAE / KIM DAEHYEON et al. | European Patent Office | 2019

Free access