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Effects of precursors on nucleation in atomic layer deposition of HfO2
Effects of precursors on nucleation in atomic layer deposition of HfO2
Effects of precursors on nucleation in atomic layer deposition of HfO2
Aarik, J. (author) / Aidla, A. (author) / Kikas, A. (author) / Kaambre, T. (author) / Rammula, R. (author) / Ritslaid, P. (author) / Uustare, T. (author) / Sammelselg, V. (author)
APPLIED SURFACE SCIENCE ; 230 ; 292-300
2004-01-01
9 pages
Article (Journal)
English
DDC:
621.35
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