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    Influence of bias voltage on copper nitride films deposited by reactive sputtering

    New search for: Pierson, J. F.

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    Influence of bias voltage on copper nitride films deposited by reactive sputtering

    New search for: Pierson, J. F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of bias voltage on copper nitride films deposited by reactive sputtering

    New search for: Pierson, J. F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Influence of bias voltage on copper nitride films deposited by reactive sputtering

    Contributors:

    Pierson, J. F. (author)

    Published in:

    SURFACE ENGINEERING -LONDON- ; 19 ; 67-69

    Publication date:

    2003-01-01

    Size:

    3 pages

    ISSN:

    0267-0844

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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