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    Work function of impurity-doped polycrystalline Si1-x-yGexCy film deposited by ultraclean low-pressure CVD

    New search for: Shim, H.
    New search for: Sakuraba, M.
    New search for: Tsuchiya, T.
    New search for: Murota, J.

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    Work function of impurity-doped polycrystalline Si1-x-yGexCy film deposited by ultraclean low-pressure CVD

    New search for: Shim, H.
    New search for: Sakuraba, M.
    New search for: Tsuchiya, T.
    New search for: Murota, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Work function of impurity-doped polycrystalline Si1-x-yGexCy film deposited by ultraclean low-pressure CVD

    New search for: Shim, H.
    New search for: Sakuraba, M.
    New search for: Tsuchiya, T.
    New search for: Murota, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Work function of impurity-doped polycrystalline Si1-x-yGexCy film deposited by ultraclean low-pressure CVD

    Contributors:

    Shim, H. (author) / Sakuraba, M. (author) / Tsuchiya, T. (author) / Murota, J. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 212-213 ; 209-212

    Publication date:

    2003-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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