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Work function of impurity-doped polycrystalline Si1-x-yGexCy film deposited by ultraclean low-pressure CVD
Work function of impurity-doped polycrystalline Si1-x-yGexCy film deposited by ultraclean low-pressure CVD
Work function of impurity-doped polycrystalline Si1-x-yGexCy film deposited by ultraclean low-pressure CVD
Shim, H. (author) / Sakuraba, M. (author) / Tsuchiya, T. (author) / Murota, J. (author)
APPLIED SURFACE SCIENCE ; 212-213 ; 209-212
2003-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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