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    Thickness dependence of resistivity for Cu films deposited by ion beam deposition

    New search for: Lim, J. W.
    New search for: Mimura, K.
    New search for: Isshiki, M.

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    Thickness dependence of resistivity for Cu films deposited by ion beam deposition

    New search for: Lim, J. W.
    New search for: Mimura, K.
    New search for: Isshiki, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Thickness dependence of resistivity for Cu films deposited by ion beam deposition

    New search for: Lim, J. W.
    New search for: Mimura, K.
    New search for: Isshiki, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Thickness dependence of resistivity for Cu films deposited by ion beam deposition

    Contributors:

    Lim, J. W. (author) / Mimura, K. (author) / Isshiki, M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 217 ; 95-99

    Publication date:

    2003-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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