Growth and Characterization of Epitaxial Wurtzite Al~1~-~xIn~xN Thin Films Deposited by UHV Reactive Dual DC Magnetron Sputtering: Fid-Bau Portal

Growth and Characterization of Epitaxial Wurtzite Al~1~-~xIn~xN Thin Films Deposited by UHV Reactive Dual DC Magnetron Sputtering

Seppanen, T. / Radnoczi, G. Z. / Tungasmita, S. / Hultman, L. / Birch, J.

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Growth and Characterization of Epitaxial Wurtzite Al~1~-~xIn~xN Thin Films Deposited by UHV Reactive Dual DC Magnetron Sputtering

Seppanen, T. / Radnoczi, G. Z. / Tungasmita, S. / Hultman, L. / Birch, J.

Growth and Characterization of Epitaxial Wurtzite Al~1~-~xIn~xN Thin Films Deposited by UHV Reactive Dual DC Magnetron Sputtering

Seppanen, T. / Radnoczi, G. Z. / Tungasmita, S. / Hultman, L. / Birch, J.

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Title:

Growth and Characterization of Epitaxial Wurtzite Al~1~-~xIn~xN Thin Films Deposited by UHV Reactive Dual DC Magnetron Sputtering

Contributors:

Seppanen, T. (author) / Radnoczi, G. Z. (author) / Tungasmita, S. (author) / Hultman, L. (author) / Birch, J. (author) / Bergman, P. / Janzen, E.

Published in:

Silicon Carbide and Related Materials 2002 ; 987-990

MATERIALS SCIENCE FORUM ; 433/436

Publication date:

2003-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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