Electron states at the (100)Ge/HfO2 Interface

Afanas'ev, V. V. / Fedorenko, Y. G. / Stesmans, A. | British Library Online Contents | 2004

Interface state energy distribution in (100)Si/HfO2

Fedorenko, Y. G. / Truong, L. / Afanas'ev, V. V. et al. | British Library Online Contents | 2004

Current conduction mechanisms in HfO2 and SrHfON thin films prepared by magnetron sputtering

Feng, L. p. / Li, N. / Tian, H. et al. | British Library Online Contents | 2014

Structural and optical properties of nitrogen-incorporated HfO2 gate dielectrics deposited by reactive sputtering

He, G. / Fang, Q. / Li, G. H. et al. | British Library Online Contents | 2007

Influence of charged particle bombardment and sputtering parameters on the properties of HfO2 films prepared by dc reactive magnetron sputtering

Liu, X. / Li, D. | British Library Online Contents | 2006