A platform for research: civil engineering, architecture and urbanism
Effects of mixed abrasives in chemical mechanical polishing of oxide films
Effects of mixed abrasives in chemical mechanical polishing of oxide films
Effects of mixed abrasives in chemical mechanical polishing of oxide films
Lu, Z. (author) / Lee, S.-H. (author) / Gorantla, V. R. K. (author) / Babu, S. V. (author) / Matijevic, E. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 18 ; 2323-2330
2003-01-01
8 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Chemical-mechanical polishing of copper and tantalum with silica abrasives
British Library Online Contents | 2001
|Chemical-Mechanical Polishing of Wafers with Copper Film by Nano-Scale Abrasives
British Library Online Contents | 2008
|British Library Online Contents | 2006
|Polishing Characteristics of CMP for Oxygen Free Copper with Manganese Oxide Abrasives
British Library Online Contents | 2009
|British Library Online Contents | 2017
|