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Chemical-mechanical polishing of copper and tantalum with silica abrasives

Li, Y. / Hariharaputhiran, M. / Babu, S. V.

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Chemical-mechanical polishing of copper and tantalum with silica abrasives

Li, Y. / Hariharaputhiran, M. / Babu, S. V.

Chemical-mechanical polishing of copper and tantalum with silica abrasives

Li, Y. / Hariharaputhiran, M. / Babu, S. V.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Chemical-mechanical polishing of copper and tantalum with silica abrasives

Contributors:

Li, Y. (author) / Hariharaputhiran, M. (author) / Babu, S. V. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 16 ; 1066-1073

Publication date:

2001-01-01

Size:

8 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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