First principles study of Si etching by CHF3 plasma source

Wang, W. / Cha, P. R. / Lee, S. h. et al. | British Library Online Contents | 2011

Surface Roughness Characterisation Using Cutting Force Analysis, Regression and Neural Network Prediction Models

Nunez, P. J. / Simao, J. / Arenas, J. M. et al. | British Library Online Contents | 2006

Surface characteristics of etched parylene-C films for low-damaged patterning process using inductively-coupled O2/CHF3 gas plasma

Ham, Y. H. / Shutov, D. A. / Kwon, K. H. | British Library Online Contents | 2013

Surface characteristics of etched parylene-C films for low-damaged patterning process using inductively-coupled O2/CHF3 gas plasma

Ham, Yong-Hyun / Shutov, Dmitriy Alexandrovich / Kwon, Kwang-Ho | British Library Online Contents | 2013

XPS analysis of Pb(Zr0.52Ti0.48)O3 thin film after dry-etching by CHF3 plasma

Lin, Y. y. / Liu, Q. / Tang, T. a. et al. | British Library Online Contents | 2000