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Production-ready dry cleaning and deposition processes for low-temperature Si and SiGe epitaxy
Production-ready dry cleaning and deposition processes for low-temperature Si and SiGe epitaxy
Production-ready dry cleaning and deposition processes for low-temperature Si and SiGe epitaxy
Buschbeck, H. M. (author) / Erhart, A. (author) / Goeggel, Y. (author) / Rosenblad, C. (author) / Wiltsche, S. (author) / Ramm, J. (author) / Dommann, A. (author) / Kummer, M. (author)
APPLIED SURFACE SCIENCE ; 224 ; 36-40
2004-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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