Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Strain relaxation of strained-Si layers on SiGe-on-insulator (SGOI) structures after mesa isolation

    New search for: Usuda, K.
    New search for: Mizuno, T.
    New search for: Tezuka, T.
    New search for: Sugiyama, N.
    New search for: Moriyama, Y.
    New search for: Nakaharai, S.
    New search for: Takagi, S. i.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Strain relaxation of strained-Si layers on SiGe-on-insulator (SGOI) structures after mesa isolation

    New search for: Usuda, K.
    New search for: Mizuno, T.
    New search for: Tezuka, T.
    New search for: Sugiyama, N.
    New search for: Moriyama, Y.
    New search for: Nakaharai, S.
    New search for: Takagi, S. i.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Strain relaxation of strained-Si layers on SiGe-on-insulator (SGOI) structures after mesa isolation

    New search for: Usuda, K.
    New search for: Mizuno, T.
    New search for: Tezuka, T.
    New search for: Sugiyama, N.
    New search for: Moriyama, Y.
    New search for: Nakaharai, S.
    New search for: Takagi, S. i.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Strain relaxation of strained-Si layers on SiGe-on-insulator (SGOI) structures after mesa isolation

    Contributors:

    Usuda, K. (author) / Mizuno, T. (author) / Tezuka, T. (author) / Sugiyama, N. (author) / Moriyama, Y. (author) / Nakaharai, S. (author) / Takagi, S. i. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 224 ; 113-116

    Publication date:

    2004-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Strain relaxation in nano-patterned strained-Si/SiGe heterostructure on insulator

    Liu, X. / Liu, W. / Ma, X. et al. | British Library Online Contents | 2010

    Observation of defects evolution in strained SiGe layers during strain relaxation

    Jang, J. H. / Phen, M. S. / Siebein, K. et al. | British Library Online Contents | 2009

    Strain characterization in SOI and strained-Si on SGOI MOSFET channel using nano-beam electron diffraction (NBD)

    Usuda, K. / Numata, T. / Irisawa, T. et al. | British Library Online Contents | 2005

    Raman study of strained SiGe layers

    Gu, S. / Zhang, R. / Han, P. et al. | British Library Online Contents | 1994

    Boron diffusion in strained and strain-relaxed SiGe

    Wang, C. C. / Sheu, Y. M. / Liu, S. et al. | British Library Online Contents | 2005

    Back to top