SiGe elevated source/drain structure and nickel silicide contact layer for sub 0.1 mm MOSFET fabrication: Fid-Bau Portal

SiGe elevated source/drain structure and nickel silicide contact layer for sub 0.1 mm MOSFET fabrication

Shim, J. / Oh, H. / Choi, H. / Sakaguchi, T. / Kurino, H. / Koyanagi, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

SiGe elevated source/drain structure and nickel silicide contact layer for sub 0.1 mm MOSFET fabrication

Shim, J. / Oh, H. / Choi, H. / Sakaguchi, T. / Kurino, H. / Koyanagi, M.

SiGe elevated source/drain structure and nickel silicide contact layer for sub 0.1 mm MOSFET fabrication

Shim, J. / Oh, H. / Choi, H. / Sakaguchi, T. / Kurino, H. / Koyanagi, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

SiGe elevated source/drain structure and nickel silicide contact layer for sub 0.1 mm MOSFET fabrication

Contributors:

Shim, J. (author) / Oh, H. (author) / Choi, H. (author) / Sakaguchi, T. (author) / Kurino, H. (author) / Koyanagi, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 224 ; 260-264

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Saha, A. R. / Chattopadhyay, S. / Bose, C. et al. | British Library Online Contents | 2005

Effect of pre-treatment and nickel layer thickness on nickel silicide/silicon carbide contact

Cao, Y. / Nyborg, L. / Jelvestam, U. et al. | British Library Online Contents | 2005

Evaluation of Schottky barrier source/drain contact on gate-all-around polycrystalline silicon nanowire MOSFET

Ho, Ching-Yuan / Chang, Yew-Jen | British Library Online Contents | 2017

Strained-Si with carbon incorporation for MOSFET source/drain engineering

Lee, M. H. / Chang, S. T. / Lee, S. W. et al. | British Library Online Contents | 2008

Selective oxidation fin channel MOSFET for source/drain series resistance reduction

Young-Kyun Cho, / Tae Moon Roh, / Jongdae Kim, | IEEE | 2006