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Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

Chappe, J. M. / Martin, N. / Pierson, J. F. / Terwagne, G. / Lintymer, J. / Gavoille, J. / Takadoum, J.

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Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

Chappe, J. M. / Martin, N. / Pierson, J. F. / Terwagne, G. / Lintymer, J. / Gavoille, J. / Takadoum, J.

Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

Chappe, J. M. / Martin, N. / Pierson, J. F. / Terwagne, G. / Lintymer, J. / Gavoille, J. / Takadoum, J.

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Document information

Title:

Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

Contributors:

Chappe, J. M. (author) / Martin, N. (author) / Pierson, J. F. (author) / Terwagne, G. (author) / Lintymer, J. (author) / Gavoille, J. (author) / Takadoum, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 225 ; 29-38

Publication date:

2004-01-01

Size:

10 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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