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Thermal oxidation of strained Si/SiGe: impact of surface morphology and effect on MOS devices

Olsen, S. H. / O'Neill, A. G. / Norris, D. J. / Cullis, A. G. / Bull, S. J. / Chattopadhyay, S. / Kwa, K. S. / Driscoll, L. S. / Waite, A. M. / Tang, Y. T.

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Thermal oxidation of strained Si/SiGe: impact of surface morphology and effect on MOS devices

Olsen, S. H. / O'Neill, A. G. / Norris, D. J. / Cullis, A. G. / Bull, S. J. / Chattopadhyay, S. / Kwa, K. S. / Driscoll, L. S. / Waite, A. M. / Tang, Y. T.

Thermal oxidation of strained Si/SiGe: impact of surface morphology and effect on MOS devices

Olsen, S. H. / O'Neill, A. G. / Norris, D. J. / Cullis, A. G. / Bull, S. J. / Chattopadhyay, S. / Kwa, K. S. / Driscoll, L. S. / Waite, A. M. / Tang, Y. T.

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Title:

Thermal oxidation of strained Si/SiGe: impact of surface morphology and effect on MOS devices

Contributors:

Olsen, S. H. (author) / O'Neill, A. G. (author) / Norris, D. J. (author) / Cullis, A. G. (author) / Bull, S. J. (author) / Chattopadhyay, S. (author) / Kwa, K. S. (author) / Driscoll, L. S. (author) / Waite, A. M. (author) / Tang, Y. T. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 109 ; 78-84

Publication date:

2004-01-01

Size:

7 pages

ISSN:

Type of media:

Article (Journal)

Type of material:

Print

Language:

English

Classification:

© Metadata Copyright the British Library Board and other contributors. All rights reserved.

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