Point defect incorporation during diamond chemical vapor deposition

Battaile, C. C. / Srolovitz, D. J. / Butler, J. E. | British Library Online Contents | 1999

Effect of Al incorporation on the AlGaN growth by metalorganic chemical vapor deposition

Zhao, D. G. / Liu, Z. S. / Zhu, J. J. et al. | British Library Online Contents | 2006

Infrared study of carbon incorporation during chemical vapor deposition of SiC using methylsilanes

Shinohara, M. / Kimura, Y. / Shoji, D. et al. | British Library Online Contents | 2001

Precursor development for the chemical vapor deposition of aluminium, copper and palladium

Graefe, A. / Heinen, R. / Klein, F. et al. | British Library Online Contents | 1996

Incorporation of boron in SiGe(C) epitaxial layers grown by reduced pressure chemical vapor deposition

Hallstedt, J. / Parent, A. / Ostling, M. et al. | British Library Online Contents | 2005