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O~2^+ versus Cs^+ for high depth resolution depth profiling of III-V nitride-based semiconductor devices
O~2^+ versus Cs^+ for high depth resolution depth profiling of III-V nitride-based semiconductor devices
O~2^+ versus Cs^+ for high depth resolution depth profiling of III-V nitride-based semiconductor devices
Kachan, M. (author) / Hunter, J. (author) / Kouzminov, D. (author) / Pivovarov, A. (author) / Gu, J. (author) / Stevie, F. (author) / Griffis, D. (author)
APPLIED SURFACE SCIENCE ; 231/232 ; 684-687
2004-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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