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A study of dynamic SIMS analysis of low-k dielectric materials

Mowat, I. A. / Lin, X. F. / Fister, T. / Kendall, M. / Chao, G. / Yang, M. H.

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A study of dynamic SIMS analysis of low-k dielectric materials

Mowat, I. A. / Lin, X. F. / Fister, T. / Kendall, M. / Chao, G. / Yang, M. H.

A study of dynamic SIMS analysis of low-k dielectric materials

Mowat, I. A. / Lin, X. F. / Fister, T. / Kendall, M. / Chao, G. / Yang, M. H.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

A study of dynamic SIMS analysis of low-k dielectric materials

Contributors:

Mowat, I. A. (author) / Lin, X. F. (author) / Fister, T. (author) / Kendall, M. (author) / Chao, G. (author) / Yang, M. H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 252 ; 7182-7185

Publication date:

2006-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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