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SIMS study of Cu trapping and migration in low-k dielectric films
SIMS study of Cu trapping and migration in low-k dielectric films
SIMS study of Cu trapping and migration in low-k dielectric films
Li, Y. (Autor:in) / Hunter, J. (Autor:in) / Tate, T. J. (Autor:in)
APPLIED SURFACE SCIENCE ; 231/232 ; 791-795
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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