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Chemical mechanical polishing (CMP) anisotropy in sapphire

Zhu, H. / Tessaroto, L. A. / Sabia, R. / Greenhut, V. A. / Smith, M. / Niesz, D. E.

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Chemical mechanical polishing (CMP) anisotropy in sapphire

Zhu, H. / Tessaroto, L. A. / Sabia, R. / Greenhut, V. A. / Smith, M. / Niesz, D. E.

Chemical mechanical polishing (CMP) anisotropy in sapphire

Zhu, H. / Tessaroto, L. A. / Sabia, R. / Greenhut, V. A. / Smith, M. / Niesz, D. E.

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Check availability in my library

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Document information

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Document information

Title:

Chemical mechanical polishing (CMP) anisotropy in sapphire

Contributors:

Zhu, H. (author) / Tessaroto, L. A. (author) / Sabia, R. (author) / Greenhut, V. A. (author) / Smith, M. (author) / Niesz, D. E. (author)

Published in:

APPLIED SURFACE SCIENCE ; 236 ; 120-130

Publication date:

2004-01-01

Size:

11 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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