Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Effect of Anisotropy on Chemical Mechanical Polishing of LBO Crystal

    New search for: Li, J.
    New search for: Zhu, Y.W.
    New search for: Zuo, D.W.
    New search for: Zhu, Y.
    New search for: Chen, C.T.
    New search for: Yao, Y.
    New search for: Zuo, D.
    New search for: Xu, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Effect of Anisotropy on Chemical Mechanical Polishing of LBO Crystal

    New search for: Li, J.
    New search for: Zhu, Y.W.
    New search for: Zuo, D.W.
    New search for: Zhu, Y.
    New search for: Chen, C.T.
    New search for: Yao, Y.
    New search for: Zuo, D.
    New search for: Xu, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of Anisotropy on Chemical Mechanical Polishing of LBO Crystal

    New search for: Li, J.
    New search for: Zhu, Y.W.
    New search for: Zuo, D.W.
    New search for: Zhu, Y.
    New search for: Chen, C.T.
    New search for: Yao, Y.
    New search for: Zuo, D.
    New search for: Xu, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effect of Anisotropy on Chemical Mechanical Polishing of LBO Crystal

    Contributors:

    Li, J. (author) / Zhu, Y.W. (author) / Zuo, D.W. (author) / Zhu, Y. (author) / Chen, C.T. (author) / Yao, Y. / Zuo, D. / Xu, X.

    Published in:

    Machining and Advanced Manufacturing Technology X ; 33-36

    KEY ENGINEERING MATERIALS ; 431/432

    Publication date:

    2010-01-01

    Size:

    4 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Chemical mechanical polishing (CMP) anisotropy in sapphire

    Zhu, H. / Tessaroto, L. A. / Sabia, R. et al. | British Library Online Contents | 2004

    Anisotropy of chemical mechanical polishing in silicon carbide substrates

    Chen, X. F. / Xu, X. G. / Hu, X. B. et al. | British Library Online Contents | 2007

    Kinematic Analysis of Chemical Mechanical Polishing and its Effect on Polishing Results

    Kim, H. / Jeong, H. / Lee, S. et al. | British Library Online Contents | 2003

    Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency

    Janoš, P. / Ederer, J. / Pilařová, V. r. et al. | British Library Online Contents | 2016

    Modeling of Polishing Pad Wear in Chemical Mechanical Polishing

    Li, M. / Zhu, Y.W. / Li, J. et al. | British Library Online Contents | 2010

    Back to top