A platform for research: civil engineering, architecture and urbanism
Etching of polycrystalline copper by oblique injection of argon ion
Etching of polycrystalline copper by oblique injection of argon ion
Etching of polycrystalline copper by oblique injection of argon ion
Taguchi, T. (author) / Yamauchi, Y. (author) / Hirohata, Y. (author) / Hino, T. (author) / Nishikawa, M. (author)
APPLIED SURFACE SCIENCE ; 237 ; 321-325
2004-01-01
5 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Oblique Ion Etching for Copper at Elevated Temperature
British Library Online Contents | 2011
|Influence of copper foil polycrystalline structure on graphene anisotropic etching
British Library Online Contents | 2017
|Polycrystalline silicon precipitates on SiO~2 using an argon excimer laser
British Library Online Contents | 1999
|Etching of polycrystalline diamond films by electron beam assisted plasma
British Library Online Contents | 1996
|Etching Characteristics of Polycrystalline 3C-SiC Films Using Enhanced RIE
British Library Online Contents | 2009
|