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    Etching Characteristics of Polycrystalline 3C-SiC Films Using Enhanced RIE

    New search for: Chung, G.S.
    New search for: Ohn, C.M.

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    Etching Characteristics of Polycrystalline 3C-SiC Films Using Enhanced RIE

    New search for: Chung, G.S.
    New search for: Ohn, C.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Etching Characteristics of Polycrystalline 3C-SiC Films Using Enhanced RIE

    New search for: Chung, G.S.
    New search for: Ohn, C.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Etching Characteristics of Polycrystalline 3C-SiC Films Using Enhanced RIE

    Contributors:

    Chung, G.S. (author) / Ohn, C.M. (author)

    Published in:

    MATERIALS SCIENCE FORUM ; 600/603 ; 875-878

    Publication date:

    2009-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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