Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Vibrational spectroscopy characterization of low-dielectric constant SiOC:H films prepared by PECVD technique

    New search for: Das, G.
    New search for: Mariotto, G.
    New search for: Quaranta, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Vibrational spectroscopy characterization of low-dielectric constant SiOC:H films prepared by PECVD technique

    New search for: Das, G.
    New search for: Mariotto, G.
    New search for: Quaranta, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Vibrational spectroscopy characterization of low-dielectric constant SiOC:H films prepared by PECVD technique

    New search for: Das, G.
    New search for: Mariotto, G.
    New search for: Quaranta, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Vibrational spectroscopy characterization of low-dielectric constant SiOC:H films prepared by PECVD technique

    Contributors:

    Das, G. (author) / Mariotto, G. (author) / Quaranta, A. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 295-300

    Publication date:

    2004-01-01

    Size:

    6 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Electrical properties of low-dielectric-constant films prepared by PECVD in O2/CH4/HMDSO

    Borvon, G. / Goullet, A. / Mellhaoui, X. et al. | British Library Online Contents | 2002

    XRR and SAXS Study of Hydrogenated Amorphous Silicon Oxycarbide (a-SiOC:H) Films

    Swain, B.P. | British Library Online Contents | 2007

    Boron-Doped Nanocrystalline Silicon Thin Films Prepared by PECVD

    Wang, X.Q. / Ding, J.N. / Yuan, N.Y. et al. | British Library Online Contents | 2012

    Influence of thermal treatment of low dielectric constant SiOC(H) films using MTES/O2 deposited by PECVD

    Navamathavan, R. / Kim, S. H. / Jang, Y. J. et al. | British Library Online Contents | 2007

    The Study of Microcrystalline Silicon Thin Films Prepared by PECVD

    Li, C.Y. / Zhang, H. / Li, J. et al. | British Library Online Contents | 2013

    Back to top