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Surface Cleaning Effects of Silicon Substrates by ECR Hydrogen Plasma on Subsequent Homoepitaxial Growth
Surface Cleaning Effects of Silicon Substrates by ECR Hydrogen Plasma on Subsequent Homoepitaxial Growth
Surface Cleaning Effects of Silicon Substrates by ECR Hydrogen Plasma on Subsequent Homoepitaxial Growth
Kim, H. W. (author)
MATERIALS SCIENCE FORUM ; 475/479 ; 4067-4070
2005-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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