Three-step mechanism of the water recombination reactions on SiO2/Si surface in the first stage of ZrO2 atomic layer deposition: Fid-Bau Portal

Three-step mechanism of the water recombination reactions on SiO2/Si surface in the first stage of ZrO2 atomic layer deposition

Jeloaica, L. / Estève, A. / Dkhissi, A. / Estève, D. / Djafari-Rouhani, M.

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Three-step mechanism of the water recombination reactions on SiO2/Si surface in the first stage of ZrO2 atomic layer deposition

Jeloaica, L. / Estève, A. / Dkhissi, A. / Estève, D. / Djafari-Rouhani, M.

Three-step mechanism of the water recombination reactions on SiO2/Si surface in the first stage of ZrO2 atomic layer deposition

Jeloaica, L. / Estève, A. / Dkhissi, A. / Estève, D. / Djafari-Rouhani, M.

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Check availability in my library

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Document information

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Document information

Title:

Three-step mechanism of the water recombination reactions on SiO2/Si surface in the first stage of ZrO2 atomic layer deposition

Contributors:

Jeloaica, L. (author) / Estève, A. (author) / Dkhissi, A. (author) / Estève, D. (author) / Djafari-Rouhani, M. (author)

Published in:

COMPUTATIONAL MATERIALS SCIENCE ; 33 ; 59-65

Publication date:

2005-01-01

Size:

7 pages

ISSN:

0927-0256

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1 / 510

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