Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Properties and characterization of low-temperature amorphous PECVD silicon nitride films for solar cell passivation

    New search for: Ali, S.
    New search for: Gharghi, M.
    New search for: Sivoththaman, S.
    New search for: Zeaiter, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Properties and characterization of low-temperature amorphous PECVD silicon nitride films for solar cell passivation

    New search for: Ali, S.
    New search for: Gharghi, M.
    New search for: Sivoththaman, S.
    New search for: Zeaiter, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Properties and characterization of low-temperature amorphous PECVD silicon nitride films for solar cell passivation

    New search for: Ali, S.
    New search for: Gharghi, M.
    New search for: Sivoththaman, S.
    New search for: Zeaiter, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Properties and characterization of low-temperature amorphous PECVD silicon nitride films for solar cell passivation

    Contributors:

    Ali, S. (author) / Gharghi, M. (author) / Sivoththaman, S. (author) / Zeaiter, K. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 40 ; 1469-1473

    Publication date:

    2005-01-01

    Size:

    5 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Effects of Substrate Temperature on the Properties of Silicon Nitride Films by PECVD

    Li, C.Y. / Li, X.F. / Chen, L.L. et al. | British Library Online Contents | 2013

    Neural network modeling of PECVD silicon nitride films

    Ghosh, S. / Dutta, P.K. / Bose, D.N. | British Library Online Contents | 1999

    Effect of deposition conditions on mechanical properties of low-temperature PECVD silicon nitride films

    Huang, H. / Winchester, K. J. / Suvorova, A. et al. | British Library Online Contents | 2006

    PECVD synthesis, optical and mechanical properties of silicon carbon nitride films

    British Library Online Contents | 2015

    Photoluminescence Properties of Silicon Nitride Prepared by VHF-PECVD

    Song, J. / Guo, Y.Q. / Song, C. et al. | British Library Online Contents | 2013

    Back to top