Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Properties and characterization of low-temperature amorphous PECVD silicon nitride films for solar cell passivation
Properties and characterization of low-temperature amorphous PECVD silicon nitride films for solar cell passivation
Properties and characterization of low-temperature amorphous PECVD silicon nitride films for solar cell passivation
Ali, S. (Autor:in) / Gharghi, M. (Autor:in) / Sivoththaman, S. (Autor:in) / Zeaiter, K. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 40 ; 1469-1473
01.01.2005
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Effects of Substrate Temperature on the Properties of Silicon Nitride Films by PECVD
British Library Online Contents | 2013
|Neural network modeling of PECVD silicon nitride films
British Library Online Contents | 1999
|PECVD synthesis, optical and mechanical properties of silicon carbon nitride films
British Library Online Contents | 2015
British Library Online Contents | 2006
|Photoluminescence Properties of Silicon Nitride Prepared by VHF-PECVD
British Library Online Contents | 2013
|