A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water
Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water
Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water
Puurunen, R. L. (author)
APPLIED SURFACE SCIENCE ; 245 ; 6-10
2005-01-01
5 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Energy barriers for trimethylaluminum reaction with varying surface hydroxyl density
| British Library Online Contents | 2011
Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
| British Library Online Contents | 2015
| British Library Online Contents | 2013
| British Library Online Contents | 2019
Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
| British Library Online Contents | 2001