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Corrosion Inhibiting Effect on Copper Chemical Mechanical Planarization (CMP) in Fe(NO~3)~3 Based Slurries
Corrosion Inhibiting Effect on Copper Chemical Mechanical Planarization (CMP) in Fe(NO~3)~3 Based Slurries
Corrosion Inhibiting Effect on Copper Chemical Mechanical Planarization (CMP) in Fe(NO~3)~3 Based Slurries
Guo, D. M. (author) / Li, X. J. (author) / Jin, Z. J. (author) / Kang, R. K. (author) / Tamaki, J. / Kuriyagawa, T. / Baron, Y. M.
2005-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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