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Laser patterning of SiOx-layers for the fabrication of UV diffractive phase elements

Schulz-Ruhtenberg, M. / Ihlemann, J. / Heber, J.

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Laser patterning of SiOx-layers for the fabrication of UV diffractive phase elements

Schulz-Ruhtenberg, M. / Ihlemann, J. / Heber, J.

Laser patterning of SiOx-layers for the fabrication of UV diffractive phase elements

Schulz-Ruhtenberg, M. / Ihlemann, J. / Heber, J.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Laser patterning of SiOx-layers for the fabrication of UV diffractive phase elements

Contributors:

Schulz-Ruhtenberg, M. (author) / Ihlemann, J. (author) / Heber, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 248 ; 190-195

Publication date:

2005-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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Laser annealing of SiOx thin films

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