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A comparative study on ultra-shallow junction formation using co-implantation with fluorine or carbon in pre-amorphized silicon
A comparative study on ultra-shallow junction formation using co-implantation with fluorine or carbon in pre-amorphized silicon
A comparative study on ultra-shallow junction formation using co-implantation with fluorine or carbon in pre-amorphized silicon
Graoui, H. (author) / Foad, M. A. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 188-191
2005-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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