Solid-phase epitaxial regrowth of a shallow amorphised Si layer studied by X-ray and medium energy ion scattering: Fid-Bau Portal

Solid-phase epitaxial regrowth of a shallow amorphised Si layer studied by X-ray and medium energy ion scattering

Capello, L. / Metzger, T. H. / Werner, M. / van den Berg, J. A. / Servidori, M. / Herden, M. / Feudel, T.

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Solid-phase epitaxial regrowth of a shallow amorphised Si layer studied by X-ray and medium energy ion scattering

Capello, L. / Metzger, T. H. / Werner, M. / van den Berg, J. A. / Servidori, M. / Herden, M. / Feudel, T.

Solid-phase epitaxial regrowth of a shallow amorphised Si layer studied by X-ray and medium energy ion scattering

Capello, L. / Metzger, T. H. / Werner, M. / van den Berg, J. A. / Servidori, M. / Herden, M. / Feudel, T.

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Document information

Title:

Solid-phase epitaxial regrowth of a shallow amorphised Si layer studied by X-ray and medium energy ion scattering

Contributors:

Capello, L. (author) / Metzger, T. H. (author) / Werner, M. (author) / van den Berg, J. A. (author) / Servidori, M. (author) / Herden, M. (author) / Feudel, T. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 200-204

Publication date:

2005-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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