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Boron distribution in silicon after excimer laser annealing with multiple pulses
Boron distribution in silicon after excimer laser annealing with multiple pulses
Boron distribution in silicon after excimer laser annealing with multiple pulses
Monakhov, E. V. (author) / Svensson, B. G. (author) / Linnarsson, M. K. (author) / La Magna, A. (author) / Italia, M. (author) / Privitera, V. (author) / Fortunato, G. (author) / Cuscuna, M. (author) / Mariucci, L. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 228-231
2005-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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