Effects of excimer-laser annealing on low-temperature-deposited silicon-nitride film: Fid-Bau Portal

Effects of excimer-laser annealing on low-temperature-deposited silicon-nitride film

Uchida, Y. / Shimizu, K. / Matsumura, M.

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Effects of excimer-laser annealing on low-temperature-deposited silicon-nitride film

Uchida, Y. / Shimizu, K. / Matsumura, M.

Effects of excimer-laser annealing on low-temperature-deposited silicon-nitride film

Uchida, Y. / Shimizu, K. / Matsumura, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effects of excimer-laser annealing on low-temperature-deposited silicon-nitride film

Contributors:

Uchida, Y. (author) / Shimizu, K. (author) / Matsumura, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 79/80 ; 350

Publication date:

1994-01-01

Size:

350 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

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