Single shot excimer laser annealing of amorphous silicon for AMLCD: Fid-Bau Portal

Single shot excimer laser annealing of amorphous silicon for AMLCD

Boher, P. / Stehle, J. L. / Stehle, M. / Godard, B.

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Single shot excimer laser annealing of amorphous silicon for AMLCD

Boher, P. / Stehle, J. L. / Stehle, M. / Godard, B.

Single shot excimer laser annealing of amorphous silicon for AMLCD

Boher, P. / Stehle, J. L. / Stehle, M. / Godard, B.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Single shot excimer laser annealing of amorphous silicon for AMLCD

Contributors:

Boher, P. (author) / Stehle, J. L. (author) / Stehle, M. (author) / Godard, B. (author)

Published in:

APPLIED SURFACE SCIENCE ; 96/98 ; 376-383

Publication date:

1996-01-01

Size:

8 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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