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    Si nanocrystal-containing SiOx (x<2) produced by thermal annealing of PECVD realized thin films

    New search for: Bedjaoui, M.
    New search for: Despax, B.
    New search for: Caumont, M.
    New search for: Bonafos, C.

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    Si nanocrystal-containing SiOx (x<2) produced by thermal annealing of PECVD realized thin films

    New search for: Bedjaoui, M.
    New search for: Despax, B.
    New search for: Caumont, M.
    New search for: Bonafos, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Si nanocrystal-containing SiOx (x<2) produced by thermal annealing of PECVD realized thin films

    New search for: Bedjaoui, M.
    New search for: Despax, B.
    New search for: Caumont, M.
    New search for: Bonafos, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Si nanocrystal-containing SiOx (x<2) produced by thermal annealing of PECVD realized thin films

    Contributors:

    Bedjaoui, M. (author) / Despax, B. (author) / Caumont, M. (author) / Bonafos, C. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 508-512

    Publication date:

    2005-01-01

    Size:

    5 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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