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Si nanocrystal-containing SiOx (x<2) produced by thermal annealing of PECVD realized thin films
Si nanocrystal-containing SiOx (x<2) produced by thermal annealing of PECVD realized thin films
Si nanocrystal-containing SiOx (x<2) produced by thermal annealing of PECVD realized thin films
Bedjaoui, M. (author) / Despax, B. (author) / Caumont, M. (author) / Bonafos, C. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 508-512
2005-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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